Detection of amorphous silica in air-oxidized Ti3SiC2 at 500 - 1000 °C

Citation

• Pang, W. K., Low, I. M., & Hanna, J. V. (2009). Detection of amorphous silica in air-oxidized Ti3SiC2 at 500 - 1000 °C. Journal of the Australian Ceramic Society, 45(1), 39-43.

Scopus Eid

• 2-s2.0-72449158081

Web Of Science Accession Number

Start Page

• 39

End Page

• 43

Volume

• 45

Issue

• 1

Abstract

• In this paper we describe the use of secondary-ion mass spectrometry (SIMS) and nuclear magnetic resonance (NMR) to detect the existence of amorphous silica in Ti3SiC2 oxidised at 500 - 1000°C. The formation of an amorphous SiO2 layer and its growth in thickness with temperature was monitored using dynamic SIMS. A duplex structure with an outer layer of TiO2 and an inner mixture layer of SiO2 and TiO2 was observed. Results of NMR verify for the first time the direct evidence of amorphous silica formation during the oxidation of Ti 3SiC2 at the temperature range 500-1000°C.

UOW Authors

•   Pang, Wei Kong

Publication Date

• 2009

Published In

• Journal of the Australian Ceramic Society  Journal

Citation

• Pang, W. K., Low, I. M., & Hanna, J. V. (2009). Detection of amorphous silica in air-oxidized Ti3SiC2 at 500 - 1000 °C. Journal of the Australian Ceramic Society, 45(1), 39-43.

Scopus Eid

• 2-s2.0-72449158081

Web Of Science Accession Number

Start Page

• 39

End Page

• 43

Volume

• 45

Issue

• 1