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Detection of amorphous silica in Air-Oxidized Ti3SiC2 at 500-1000��C by NMR and SIMS

Conference Paper


Abstract


  • The use of secondary-ion mass spectrometry (SIMS), nuclear magnetic resonance (NMR) and transmission electron microscopy (TEM) to detect the existence of amorphous silica in Ti3SiC2 oxidised at 500-1000��C is described. The formation of an amorphous SiO2 layer and its growth in thickness with temperature was monitored using dynamic SIMS. Results of NMR and TEM verify for the first time the direct evidence of amorphous silica formation during the oxidation of Ti3SiC2 at ���1000��C. �� (2010) Trans Tech Publications.

Publication Date


  • 2010

Citation


  • Pang, W. K., Low, I. M., & Hanna, J. V. (2010). Detection of amorphous silica in Air-Oxidized Ti3SiC2 at 500-1000��C by NMR and SIMS. In Key Engineering Materials Vol. 434-435 (pp. 169-172). doi:10.4028/www.scientific.net/KEM.434-435.169

Scopus Eid


  • 2-s2.0-77955435816

Start Page


  • 169

End Page


  • 172

Volume


  • 434-435

Issue


Place Of Publication


Abstract


  • The use of secondary-ion mass spectrometry (SIMS), nuclear magnetic resonance (NMR) and transmission electron microscopy (TEM) to detect the existence of amorphous silica in Ti3SiC2 oxidised at 500-1000��C is described. The formation of an amorphous SiO2 layer and its growth in thickness with temperature was monitored using dynamic SIMS. Results of NMR and TEM verify for the first time the direct evidence of amorphous silica formation during the oxidation of Ti3SiC2 at ���1000��C. �� (2010) Trans Tech Publications.

Publication Date


  • 2010

Citation


  • Pang, W. K., Low, I. M., & Hanna, J. V. (2010). Detection of amorphous silica in Air-Oxidized Ti3SiC2 at 500-1000��C by NMR and SIMS. In Key Engineering Materials Vol. 434-435 (pp. 169-172). doi:10.4028/www.scientific.net/KEM.434-435.169

Scopus Eid


  • 2-s2.0-77955435816

Start Page


  • 169

End Page


  • 172

Volume


  • 434-435

Issue


Place Of Publication