Skip to main content
placeholder image

Deposition mechanism of aluminum on uranium in AlCl3-1-ethyl-3-methylimidazolium chloride ionic liquid by galvanic displacement

Journal Article


Abstract


Publication Date


  • 2018

Citation


  • Jiang, Y., Fang, L., Luo, L., Wang, S., & Wang, X. (2018). Deposition mechanism of aluminum on uranium in AlCl3-1-ethyl-3-methylimidazolium chloride ionic liquid by galvanic displacement. Journal of Applied Electrochemistry, 48(7), 827-834. doi:10.1007/s10800-018-1204-4

Web Of Science Accession Number


Start Page


  • 827

End Page


  • 834

Volume


  • 48

Issue


  • 7

Abstract


Publication Date


  • 2018

Citation


  • Jiang, Y., Fang, L., Luo, L., Wang, S., & Wang, X. (2018). Deposition mechanism of aluminum on uranium in AlCl3-1-ethyl-3-methylimidazolium chloride ionic liquid by galvanic displacement. Journal of Applied Electrochemistry, 48(7), 827-834. doi:10.1007/s10800-018-1204-4

Web Of Science Accession Number


Start Page


  • 827

End Page


  • 834

Volume


  • 48

Issue


  • 7