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Deposition mechanism of aluminum on uranium in AlCl3-1-ethyl-3-methylimidazolium chloride ionic liquid by galvanic displacement
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Jiang, Y., Fang, L., Luo, L., Wang, S., & Wang, X. (2018). Deposition mechanism of aluminum on uranium in AlCl3-1-ethyl-3-methylimidazolium chloride ionic liquid by galvanic displacement. Journal of Applied Electrochemistry, 48(7), 827-834. doi:10.1007/s10800-018-1204-4
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Jiang, Y., Fang, L., Luo, L., Wang, S., & Wang, X. (2018). Deposition mechanism of aluminum on uranium in AlCl3-1-ethyl-3-methylimidazolium chloride ionic liquid by galvanic displacement. Journal of Applied Electrochemistry, 48(7), 827-834. doi:10.1007/s10800-018-1204-4
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