Deposition mechanism of aluminum on uranium in AlCl3-1-ethyl-3-methylimidazolium chloride ionic liquid by galvanic displacement

Citation

• Jiang, Y., Fang, L., Luo, L., Wang, S., & Wang, X. (2018). Deposition mechanism of aluminum on uranium in AlCl3-1-ethyl-3-methylimidazolium chloride ionic liquid by galvanic displacement. Journal of Applied Electrochemistry, 48(7), 827-834. doi:10.1007/s10800-018-1204-4

Digital Object Identifier (doi)

• 10.1007/s10800-018-1204-4

Web Of Science Accession Number

Start Page

• 827

End Page

• 834

Volume

• 48

Issue

• 7

Abstract

UOW Authors

•   Wang, Xiaolin

Publication Date

• 2018

Publisher

• Springer Science and Business Media LLC 

Published In

• Journal of Applied Electrochemistry  Journal

Citation

• Jiang, Y., Fang, L., Luo, L., Wang, S., & Wang, X. (2018). Deposition mechanism of aluminum on uranium in AlCl3-1-ethyl-3-methylimidazolium chloride ionic liquid by galvanic displacement. Journal of Applied Electrochemistry, 48(7), 827-834. doi:10.1007/s10800-018-1204-4

Digital Object Identifier (doi)

• 10.1007/s10800-018-1204-4

Web Of Science Accession Number

Start Page

• 827

End Page

• 834

Volume

• 48

Issue

• 7