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Detection of Amorphous Silica in Oxidized Maxthal Ti3SiC2 at 500-1000°C

Chapter


Abstract

  • This paper describes the use of secondary-ion mass spectrometry (SIMS), nuclear magnetic

    resonance (NMR) and transmission electron microscopy (TEM) to identify the amorphous silica in

    Ti3SiC2 oxidised at 500-1000°C. The formation of an amorphous Si02 layer and its growth in

    thickness with temperature was monitored using dynamic SIMS. Results of NMR and TEM verify for

    the first time the direct evidence of amorphous silica formation during the oxidation of TbSiC2 at

    l000°C.

UOW Authors

  •   Pang, Wei Kong
  •   Low, Itmeng (external author)
  •   Hanna, J V. (external author)
  •   Palmquist, J P. (external author)

Publication Date

  • 2010

Citation

  • Pang, W. K., Low, I. M., Hanna, J. V. & Palmquist, J. P. (2010). Detection of Amorphous Silica in Oxidized Maxthal Ti3SiC2 at 500-1000°C. Strategic Materials and Computational Design, Volume 31, Issue 10 (pp. 181-190). Hoboken, New Jersey: John Wiley and Sons.

International Standard Book Number (isbn) 13

  • 9780470921913

Book Title

  • Strategic Materials and Computational Design, Volume 31, Issue 10

Start Page

  • 181

End Page

  • 190

Place Of Publication

  • Hoboken, New Jersey

Abstract

  • This paper describes the use of secondary-ion mass spectrometry (SIMS), nuclear magnetic

    resonance (NMR) and transmission electron microscopy (TEM) to identify the amorphous silica in

    Ti3SiC2 oxidised at 500-1000°C. The formation of an amorphous Si02 layer and its growth in

    thickness with temperature was monitored using dynamic SIMS. Results of NMR and TEM verify for

    the first time the direct evidence of amorphous silica formation during the oxidation of TbSiC2 at

    l000°C.

UOW Authors

  •   Pang, Wei Kong
  •   Low, Itmeng (external author)
  •   Hanna, J V. (external author)
  •   Palmquist, J P. (external author)

Publication Date

  • 2010

Citation

  • Pang, W. K., Low, I. M., Hanna, J. V. & Palmquist, J. P. (2010). Detection of Amorphous Silica in Oxidized Maxthal Ti3SiC2 at 500-1000°C. Strategic Materials and Computational Design, Volume 31, Issue 10 (pp. 181-190). Hoboken, New Jersey: John Wiley and Sons.

International Standard Book Number (isbn) 13

  • 9780470921913

Book Title

  • Strategic Materials and Computational Design, Volume 31, Issue 10

Start Page

  • 181

End Page

  • 190

Place Of Publication

  • Hoboken, New Jersey